≥99.996% Nitrogen Trifluoride NF₃ CAS 7783-54-2, for Semiconductor Cleaning, Plasma Etching, and High-End Electronic Gas Applications

1. Product Overview

Nitrogen Trifluoride (NF₃) is an important high-purity electronic specialty gas, widely used in semiconductor manufacturing, display panels, solar cells, and advanced electronic material production.

NF₃ features excellent fluorination capability and high plasma reaction efficiency, making it an important cleaning gas and etching auxiliary gas in the semiconductor industry.

According to the product inspection report provided by Changzhou Jiayuan Chemical Co., Ltd., the purity of this batch of Nitrogen Trifluoride is ≥99.996%, with test results showing purity >99.996%, meeting the requirements.

2. Specifications

Product Name: Nitrogen Trifluoride

English Name: Nitrogen Trifluoride

Abbreviation: NF₃

Chemical Formula: NF₃

CAS No.: 7783-54-2

Product Category: High-Purity Electronic Gas

Purity: ≥99.996%

Appearance: Colorless Gas

Packaging: High-Purity Cylinders

3. Product Quality Specifications

NF₃ Purity: >99.996%;

N₂: 0.11 ppm (≤5 ppm);

O₂+Ar: <0.01 ppm (≤3 ppm);

CF₄: 14.25 ppm (≤20 ppm);

CO: <0.01 ppm (≤1 ppm);

CO₂: 0.01 ppm (≤1 ppm);

N₂O: <0.01 ppm (≤1 ppm);

SF₆: <0.04 ppm (≤1 ppm);

HF: <0.05 ppm (≤1 ppm);

H₂O: 0.03 ppm (≤1 ppm).

4. Main Application Areas

① Semiconductor Cleaning Gas

NF₃ is a widely used cleaning gas in semiconductor manufacturing processes, used to remove silicides, nitrides, and other deposits from CVD equipment chambers.

② Plasma Etching

NF₃ generates reactive fluorine through plasma, enabling precision material processing.

③ TFT-LCD and Display Industry

Used for cleaning thin-film deposition equipment in display panel production processes.

④ Photovoltaic Industry

Used for equipment cleaning and specialty processes in solar cell manufacturing.

5. Product Characteristics and Advantages

① High-Purity Electronic-Grade Quality

Purity >99.996%, meeting the requirements of advanced electronic manufacturing.

② Low Impurity Control

Test reports show that key impurities including moisture, HF, SF₆, and CO are controlled at ppm levels.

③ Efficient Fluorine Source

Features favorable plasma reaction efficiency, suitable for precision manufacturing processes.

6. Distinctions from Related Products

① NF₃ vs. SF₆

NF₃ is primarily used for semiconductor cleaning and etching; SF₆ is mainly used for power insulation and certain etching processes.

② NF₃ vs. CF₄

CF₄ is a traditional etching gas, while NF₃ offers higher reactivity and cleaning efficiency.

③ NF₃ vs. C₄F₆/C₄F₈

NF₃ is primarily used for cleaning and fluorine source supply; C₄F₆ and C₄F₈ are mainly used for fine pattern etching.

7. Russian Market Procurement Considerations

Customers typically focus on the following:

-NF₃ Purity;

-CF₄ Content;

-Moisture Content;

-HF Content;

-SF₆ and Other Impurities;

-Cylinder Cleanliness;

-Technical Documentation including COA, TDS, SDS, and Shipping Documents.

The NF₃ test results for this batch from Changzhou Jiayuan Chemical Co., Ltd. meet the specified technical requirements.

8. Product Supply Advantages

-High-Purity Electronic Gas Supply;

-Suitable for Semiconductor Industry Chain Customers;

-Strict Control of ppm-Level Impurities;

-Provides Complete Quality Documentation;

-Supports International Market Supply.

9. Frequently Asked Questions (FAQ)

Q: What are the main applications of Nitrogen Trifluoride?

A: It is mainly used in semiconductor cleaning, plasma etching, display panels, and photovoltaic manufacturing.

Q: Why is high-purity NF₃ required?

A: Electronic manufacturing processes are highly sensitive to impurities. High-purity NF₃ improves process stability and product yield.

Q: What documentation is typically required for NF₃ procurement?

A: COA, TDS, SDS, cylinder specifications, and shipping documentation are typically required.