99.995%High-purity hexafluoro-1,3-butadiene (C₄F₆, CAS 685-63-2) is used in semiconductor etching, electronic specialty gases, and advanced microelectronics manufacturing applications.

1. Product Overview
Hexafluoro-1,3-butadiene (C₄F₆) is a high-end fluorine-containing electronic specialty gas and one of the important etching gases in advanced semiconductor manufacturing.

C₄F₆ features a high fluorine content, good plasma reactivity, and excellent etching selectivity, making it primarily used in advanced chip manufacturing, dielectric layer etching, microelectronics processing, and high-end electronic materials.

Compared to traditional fluorine-containing etching gases, hexafluorobutadiene can meet the demands of advanced semiconductor processes for high selectivity, low damage, and fine patterning.

The Russian market primarily targets semiconductor manufacturers, electronic specialty gas suppliers, research institutions, high-end electronic materials companies, and professional gas traders.

2. Specifications

Product Name: Hexafluoro-1,3-butadiene

English Name: Hexafluoro-1,3-butadiene

Aliases: C₄F₆, HFBD

Chemical Formula: C₄F₆

CAS Number: 685-63-2

Product Category: Electronic Specialty Gases / High-Purity Fluorine-Containing Gases

Appearance: Colorless gas

Purity: 99.995%

Packaging: High-cleanliness steel cylinder packaging

Storage: Store in a cool, ventilated environment, away from heat and fire sources.

3. Main Application Areas

① Semiconductor Etching Gas
Hexafluorobutadiene is mainly used in plasma etching processes in advanced semiconductor manufacturing. It can be used for the precision processing of low-dielectric materials, oxides, and other thin film materials.

② Advanced Chip Manufacturing
Suitable for the manufacturing processes of advanced logic chips, memory chips, and high-density electronic devices.

③ Microelectronics and MEMS Manufacturing
Used for microelectromechanical systems, precision electronic structure processing, and special pattern etching.

④ Electronic Materials Research and Development
Used for research on novel semiconductor process gases and high-performance electronic materials.

4. Differences from Other Electronic Specialty Gases

① Hexafluorobutadiene and Octafluorocyclobutane (C₄F₈)

Both C₄F₆ and C₄F₈ are used in semiconductor etching. C₄F₆ has a higher carbon-fluorine ratio and stronger polymerization film-forming ability, giving it an advantage in advanced fine etching; C₄F₈ has a wider range of applications.

② Hexafluorobutadiene and Sulfur Hexafluoride (SF₆)

C₄F₆ is mainly used for precision semiconductor etching, while SF₆ is more widely used in insulation, etching, and industrial gases.

③ Hexafluorobutadiene and Hexafluoropropylene (HFP)

HFP is mainly used as a fluoropolymer monomer, while C₄F₆ is mainly used as an electronic specialty gas.

5. Key Considerations for Russian Market Procurement
Russian customers typically focus on the following when purchasing hexafluorobutadiene:

- Gas purity;
- Moisture content;

- Impurities such as oxygen and nitrogen;

- Control of metallic impurities;

- Cylinder cleanliness;

- Filling stability;

Technical documents such as COA, TDS, and SDS.

6. Product Advantages

- High-end electronic specialty gases for advanced semiconductor processes;

- Excellent plasma etching performance;

- High selectivity and low process damage advantages;

- Meets the needs of advanced microelectronics manufacturing;

Suitable for the high-value-added electronic materials market.

7. Packaging and Storage
Hexafluorobutadiene is typically packaged in high-cleanliness steel cylinders.

During storage and transportation, high temperatures, impacts, and leaks should be avoided, and management should be carried out in accordance with relevant regulations for electronic specialty gases and compressed gases.

8. Frequently Asked Questions (FAQ)

Q: In which industries is hexafluorobutadiene mainly used?

A: Mainly used in semiconductor manufacturing, integrated circuits, MEMS, electronic materials, and advanced etching processes.

Q: Why is hexafluorobutadiene suitable for advanced etching?

A: Its molecular structure can create a plasma environment suitable for fine machining, which helps improve etching selectivity and pattern control.

Q: What is the difference between hexafluorobutadiene and octafluorocyclobutane?

A: C₄F₆ is more geared towards advanced fine etching applications, while C₄F₈ has a wider range of applications and is one of the commonly used electronic etching gases.

Q: What documents are required for purchasing hexafluorobutadiene in Russia?

A: Typically, a Certificate of Authorization (COA), TDS, SDS, cylinder information, and shipping documents are required.